Original Article
  • High-Performance Electromagnetic Interference Shielding of Acid-Doped Single-Walled Carbon Nanotubes

  • Flandy*, **, Yongho Joo*, **†

  • * Functional Composite Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 55324, Republic of Korea
    ** Nanoscience and Technology, KIST School, Korea National University of Science and Technology (UST), Daejeon 34113, Republic of Korea

  • This article is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/4.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

The increasing demand for lightweight electromagnetic interference (EMI) shielding materials has made single-walled carbon nanotubes (SWCNTs) attractive candidates due to their intrinsically high electrical conductivity. In this study, we investigate the effect of acid doping on the EMI shielding (EMI SH) performance of SWCNT films. The films were fabricated via a simple vacuum filtration process and doped using camphor sulfonic acid (CaSA) and chlorosulfonic acid (CSA). A systematic investigation of CaSA concentration revealed only minimal changes in the overall EMI shielding effectiveness. In contrast, increasing the maceration time during CSA post-treatment resulted in a modest enhancement in shielding effectiveness (≈2–3 dB). However, prolonged maceration led to noticeable structural degradation of the SWCNT films. These results indicate that acid doping primarily influences the shielding behavior rather than significantly improving the total shielding effectiveness, highlighting the importance of optimizing acid strength and processing conditions for SWCNT-based EMI shielding materials.


Keywords: Single-walled carbon nanotube, EMI shielding, Camphor sulfonic acid, Chlorosulfonic acid

This Article

Correspondence to

  • Yongho Joo

  • * Functional Composite Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 55324, Republic of Korea
    ** Nanoscience and Technology, KIST School, Korea National University of Science and Technology (UST), Daejeon 34113, Republic of Korea

  • E-mail: yjoo0727@kist.re.kr